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Politics : Formerly About Advanced Micro Devices -- Ignore unavailable to you. Want to Upgrade?

To: Dan3 who wrote (72354)	9/19/1999 5:25:00 PM
From: Elmer	Read Replies (1) \| Respond to of 1572517

It has long been speculated on this thread that LIs were the cause of AMD's yield problems and his post just confirms what some of us thought all along. EP

To: Dan3 who wrote (72354)	9/19/1999 11:51:00 PM
From: Process Boy	Read Replies (1) \| Respond to of 1572517

dan3 - re: Chevyman posts I still find it hard to believe that an obvious problem of this nature took so long to figure out. Resist removal chemistries should have a huge selectivity factor relative to the film, in this case ILD. Blown contacts would be easily detected in cross section. Other parts of his post seem to infer something may have been eating out the tungsten plugs. This also would have been easily detected in cross section. Still a puzzle to me, which is OK. I don't believe this person is totally privy to the Engineering side of this thing, but he is obviously trying to understand the factors that are determining his organization's successes and failures. Probably a good employee; team player kind of guy. PB