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To: Ian@SI who wrote (23690)	12/1/1999 11:38:00 AM
From: Proud_Infidel	Read Replies (2) \| Respond to of 25960

Komatsu says 193-nm laser for lithography exceeds 5 billion pulses Semiconductor Business News (12/01/99, 10:25:53 AM EDT) SANTA CLARA, Calif.--Komatsu Ltd.'s Excimer Laser Department company here today announced it has completed work on a new argon fluoride (ArF) laser light source for 193-nanometer lithography systems used in development and production of next-generation ICs. The 2-kHz deep-UV excimer laser light source features a laser design and chamber that is expected to have a life of more than 5 billion pluses, according to Komatsu. The company claimed this life expectancy is the longest in the industry. The G20A provides 10 watts of output at a 2-kHz repetition rate, with integrated energy stability of less than -0.3% (50 pulses), said Komatsu, which added that the light source has a narrowed spectral bandwidth less than 0.5pm (FWHM) to make it suitable for next-generation 193-nm scanners. Komatsu said the G20A system is suitable for both development and production applications in wafer processing because it has a 193-nm coherent light source that enables highly accurate measurements and inspection.