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To: kinkblot who wrote (11)	5/25/2000 1:25:00 PM
From: kinkblot	Respond to of 83

AMAT xR200S Ion Implanter #3 appliedmaterials.com "By increasing the performance of our xR200S system, we have significantly improved the economics of this critical step used in SOITEC's wafer fabrication process. Our collaborative work has resulted in a 10x improvement in ion source lifetime, which translates to a 5x reduction in system cost of consumables. We've also teamed with SOITEC since 1997 on 300mm wafers when the company began sampling its UNIBOND® technology using Applied Materials' 300mm ion implant system." -- Craig Lowrie, VP, Applied Materials' Ion Implant Division appliedmaterials.com - 'S'-series, 03/14/97

To: kinkblot who wrote (11)	9/20/2000 9:04:17 PM
From: kinkblot	Read Replies (1) \| Respond to of 83

SiGen and Applied Materials Collaborate on SOI Wafer Smoothing Technology appliedmaterials.com SiGen and SOITEC can settle their differences in court. Meanwhile, Applied Materials supplies this new epi smoother to one, implanters to the other. Either way, Applied participates. The new SOI technology capability was demonstrated on an Applied Materials' Epi Centura® epitaxial deposition system which provided sub-angstrom smoothness and excellent thickness control, even for SOI wafers having a starting roughness as large as 60 angstroms. Not too shabby! Sub-angstrom doesn't leave much room for improvement. WT

To: kinkblot who wrote (11)	4/18/2002 5:09:06 PM
From: kinkblot	Read Replies (2) \| Respond to of 83

Jury verdict in case Soitec v. SiGen: sigen.com sigen.com soitec.com The patent asserted was Soitec's U.S. Patent No. 5,374,564, "Process for the production of thin semiconductor material films". The bourse finds in favor of Silicon Genesis: about one fourth of Soitec's market cap has been lopped off since the verdict was delivered (24-->18 euros). The SOX index is down less than 1% over the same period. A key finding was that the 'enablement' requirement was not met except for hydrogen ions, which invalidates the more general claims for "hydrogen or rare gas ions." This makes it a moot point whether or not the alternative energy sources used by SiGen are 'equivalent' to using thermal energy. Also, Claim 1 defines the temperature of the heat treatment step in more general physical terms, whereas the still valid subclaim, Claim 4, specifies a temperature. The decision lets SiGen off the hook except for some early work in which they used hydrogen only in combination with a thermal treatment at greater than 500 degrees C. WT