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To: The Ox who wrote (13818)8/22/2000 5:09:58 PM
From: The Ox  Respond to of 14427
 
U.S. Semiconductor Manufacturing and the 300 mm Challenge

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To: The Ox who wrote (13818)8/22/2000 5:23:46 PM
From: Peter V  Read Replies (1) | Respond to of 14427
 
thanks for the explanation. I guess photolithography is for imprinting a pattern on the chip and the isotropic etch systems are for removing the photoresist material after the pattern is imprinted. Is that close?


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