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To: fyodor_ who wrote (18126)11/7/2000 8:14:26 PM
From: AlighieriRead Replies (2) | Respond to of 275872
 
PSM and OPC technology are used by every semi manufacturer to extend the limits of optical lithography (PSMs) and refine CD and feature definition (OPCs). I don't believe that Intel is screening AMD from access to these nor from the latest advancements in litho equipment. Info on both techniques.

Al

photomask.com



To: fyodor_ who wrote (18126)11/7/2000 10:34:29 PM
From: Bill JacksonRespond to of 275872
 
fyo, It is hard to say, I agree that you will not be able to assume what works at 248 will give the same proportional advantage at 193, we could run into a wall due to some limitation. In addition the early adopters have some advantages, but there are also risks that newer equipment can leapfrog the older equipment. With Intel locked into a copy exact philosophy they are locked out of newtech, although I am sure they are not blind and will adapt, but the lead will have been lost.
To what degree are some of these pieces of equipment sole sourced? I would think that any equipment manufacturer would avoid any sort of total shutdown of a potentially large client like AMD, MOT, IBM etc, by making a total production commitment to Intel.
Once the hackles rise parallel fabrication setups will evolve since there is time to do it as well as the need to do it because if they do not feed the demand others will arise, look at AMD and Intel......AMD filled a demand Intel could/would not fill....to wit, lower priced CPUs.
Lower priced far UV lithography machines may well be in the same category.

Bill