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To: fyodor_ who wrote (18136)11/7/2000 11:58:50 PM
From: AlighieriRead Replies (1) | Respond to of 275872
 
I was simply saying that a shortage of equipment could hurt AMD.

Fyodor, thanks for the links. On the above, why would it only hurt AMD?

I don't agree with you about the current usage of PSM and OPC, though. See e.g. the following dated September 4 this year (also mentions DuPont Photomasks Inc):

Fyodor, I am not sure I understand what you disagree with.

Attenuating or leaky chrome and alternating psms are used to achieve sharper edge definition, and to "trick" exposure light below the source wavelenght, making possible linewidth CDs (for example) smaller than one could achieve with binary masks on the same stepper.

OPCs are local subres features of chrome that are left behind or machined away to prevent corner over-etch, distortion of vias and/or etch bias on isolated features, as examples.

These techniques are used today and will be necessary at 193nm. Do you still disagree?

Al