To: semi_infinite who wrote (264 ) 10/26/2001 10:27:43 AM From: semi_infinite Read Replies (1) | Respond to of 640 I feel that Aixtron was deceptive in their prior release giving the impression that they were the enabling tool for the Si-STO-GaAs epitaxy work. The "tool of record" was Applied Epi's (now part of Veeco) and Veeco is now in good position for supplying research and production units. Veeco Supplies MBE System to IQE, Motorola Epi Wafer Supplier For GaAs on Silicon Application WOODBURY, N.Y.--(BUSINESS WIRE)--Oct. 26, 2001--Veeco Instruments Inc. (NASDAQ:VECO - news) announced today that IQE of Bethlehem, PA is using its Applied Epi molecular beam epitaxy (MBE) system in conjunction with Motorola's breakthrough gallium arsenide (GaAs) deposition on silicon wafers. IQE, the leading merchant epiwafer supplier for the compound semiconductor industry, and one of Motorola's key suppliers of epiwafers, recently took shipment of an Applied Epi dual chamber GEN2000 production system. Applied Epi was acquired by Veeco in September. Motorola's technology allows very thin, high purity layers of III-V semiconductor materials to be grown on a silicon substrate using an intermediate conforming layer. This integration of high-speed compound semiconductor films deposited on low-cost, production-proven, silicon wafers has the potential to reduce opto-electronic and RF device costs tenfold. Until now, there has been no way to combine costly, light-emitting compound semiconductors with silicon integrated circuits on a single wafer, providing high-speed, reduced size, low cost communication devices for broadband optical and wireless applications. According to Edward H. Braun, Chairman, President and Chief Executive Officer of Veeco Instruments, ``We are pleased that IQE has chosen our MBE systems for their work with Motorola. As the leading MBE equipment company, Applied Epi is well positioned to support the commercialization of these revolutionary devices.'' Thomas Hierl, Chief Technical Officer of IQE, commented, ``The GEN2000 is the first production system to integrate MBE and ultra-high vacuum technologies with silicon-style cluster tool architecture, and now dual reactors. We believe the Dual GEN2000 MBE system best supports the growth and throughput requirements of this new application.''