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To: AK2004 who wrote (162075)	3/13/2002 4:56:30 PM
From: dale_laroy	Read Replies (2) \| Respond to of 186894

>now, is not 1.25 years delay would be a bit of a stretch considering that there is no info, at this point, to support any delays whatsoever.< It appears that AMD is counting on being able to reach the 90nm node using 248nm laser lithography tools. This is actually quite reasonable given enough time. A fair percentage of the industry anticipates being able to reach the 65nm node using 157nm laser lithography. Going strictly on the basis of laser wavelength to design rules, 157nm is approximately 2.415 times 65nm, 193nm is approximately 2.415 times 80nm, and 248nm is 2.48 times 100nm. Of course, exact scaling would not be expected, so it is likely that it would be no more difficult to reach the 90nm node using 248nm laser lithography tools or 75nm node using 193nm laser lithography tools, than to reach the 65nm node using 157nm laser lithography tools. The problem is, it might not be any easier either, and the ability to reach the 65nm node using 157nm laser lithography is not expected until 2005, which means the other two potentials might not be reached until 2005 either. I expect AMD to make the decision to switch to 193nm laser lithography tools for the 90nm node late enough to delay the transition to Q2 2004.