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To: semiconeng who wrote (81290)	6/2/2002 1:27:02 AM
From: Yousef	Read Replies (1) \| Respond to of 275872

Semiconeng, Re: "-- If I recall my Litho (it's been 4 years), the pellicle was the material that the chrome lines of the photomask were adhered to." This is not correct ... The chrome is patterned on a quartz substrate (248nm and above). The pellicle is a thin cellulose membrane that is held about 3cm away from the chrome by a frame. The purpose of a pellicle is that any particle landing on the pellicle is out of the focal plane and thus does not print. Without a pellicle, any particle landing on the chrome pattern would be repeated on every printed field. These pellicles are very thin and flexible ... I can easily believe that they wouldn't hold up well to 157nm radiation. Make It So, Yousef