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Technology Stocks : Applied Materials No-Politics Thread (AMAT) -- Ignore unavailable to you. Want to Upgrade?

To: Ian@SI who wrote (1551)	7/16/2002 9:45:18 PM
From: Gottfried	Read Replies (1) \| Respond to of 25522

Ian, thank you. I can only guess that some customers are asking for a delay in delivery and that causes the billings to drop slightly [?]. If we look at SEMI history, we can see that the last two bookings bottoms were followed by billings bottoms a few months later. suite101.com G.

To: Ian@SI who wrote (1551)	7/17/2002 8:17:03 AM
From: Proud_Infidel	Read Replies (1) \| Respond to of 25522

Mitsubishi Chemical and Applied Materials Collaborate to Provide Chemistry for New Oasis Clean System Proprietary AM1 Chemistry Used in New Single-Step AM-Clean Process TOKYO--(BUSINESS WIRE)--July 17, 2002--Mitsubishi Chemical Corp. and Applied Materials, Inc. announced their jointly-developed AM1 chemistry for Applied Materials' new single-wafer Oasis Clean(TM) system. The proprietary AM1 chemistry, when used in the Oasis system's AM-Clean process, enables improved particle removal performance and simplified chemical management compared to traditional SC1 and SC2 wet bench chemistries. Mr. Tatsuo Kamemura, general manager, Chemical System Service Dept. of Mitsubishi Chemical Corp. said, "Mitsubishi Chemical's good chemical and additive technologies and products are widely used in semiconductor manufacturers' most advanced production lines. This unique collaboration with Applied Materials has enabled us to fine-tune our chemistry to the exact specifications of their AM-Clean process to achieve the highest performance possible. We believe that the Oasis Clean system, using AM1 chemistry in the AM-Clean process, will significantly improve the way semiconductor wafers are processed, enabling next-generation nanometer-scale chipmaking." The AM1 chemistry offers many advantages over traditional wet cleaning chemicals that have been virtually unchanged for over 30 years. Using AM1 chemistry, the Oasis system's single-step AM-Clean can be performed in less than 30 seconds, compared to more than 20 minutes for an SC1-SC2 cycle. In addition to removing virtually 100 percent of the particles from the front and back sides of the wafer, the AM-Clean reduces overall chemical usage, yet provides every wafer with fresh chemistry, eliminating wafer-to-wafer cross contamination. "Mitsubishi Chemical Co. has established itself as one of the premier suppliers of the highest-quality chip manufacturing chemicals, and our customers around the world have the highest confidence in their chemical products. We are pleased to be working with them on this innovative chemical formulation for our new system," noted Dr. Kelly Truman, general manager of Applied Materials' Wet Clean Division. Mitsubishi Chemical, a diversified chemical concern headquartered in Tokyo, Japan, has a consolidated annual turnover of approximately 14 billion U.S. dollars. It serves world customers with petrochemicals, carbon products, agricultural chemical products, information and electronics products and systems, pharmaceuticals, specialty products and various types of composite materials. Mitsubishi Chemical's web site is www.m-kagaku.co.jp. Applied Materials, the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' web site is www.appliedmaterials.com. For more information about the AM1 chemical, visit the GEM Microelectronic Materials booth #5843 at Semicon West 2002, from July 22-24 in the Moscone Center, San Francisco, California. The Oasis Clean(TM) system will be exhibited in Applied Materials' booth #1026.