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To: Proud_Infidel who wrote (920)2/24/2004 7:50:06 AM
From: Proud_Infidel  Read Replies (1) | Respond to of 43407
 
Nikon tips a $25 million, high NA stepper: updated
By Peter Clarke
Silicon Strategies
02/24/2004, 5:29 AM ET

TOKYO -- Nikon Corp. said Monday (February 23, 2004) that it has developed a 193-nm wavelength optical lithography machine that will ship with the world's highest numerical aperture lens making it suitable for 65-nm manufacturing processes.

However, Nikon also said that systems would be priced at 2.8 billion yen or about US$26 million. Nikon said it would start taking orders for the NSR-S308F scanner system in April 2004. The system would be equipped with a 0.92 numerical aperture projection lens, Nikon said.

The system is set to have a throughput of 140 wafers per hour for 300-mm diameter wafers -- not 200-mm as stated on Monday (February 23, 2004) -- and an alignment accuracy of 8 nanometers thanks to the adoption of a newly developed equipment body.