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To: Rink who wrote (196857)5/15/2006 4:19:16 PM
From: dougSF30Read Replies (1) | Respond to of 275872
 
Rink, I don't follow you. That article claimed that not only was leakage "solved" at 45nm, but that there were some yield BREAKTHROUGHS as well, and the latter can also be applied to 65nm over time, though the former cannot.

So are you saying you don't believe the "yield breakthrough" portion of the article?



To: Rink who wrote (196857)5/15/2006 4:28:00 PM
From: combjellyRead Replies (1) | Respond to of 275872
 
"If Intel has indeed furthered low-k for 45nm then it will virtually garantee a break through in reduced leakage."

Intel has high-k for gate material and metal for the gates themselves slated for 45nm. This is very high risk.


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