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To: Sarmad Y. Hermiz who wrote (243153)	11/1/2007 12:37:44 AM
From: combjelly	Read Replies (1) \| Respond to of 275872

"Does hi-k bring with it metal gates ? or are they independent ?" They don't have to be linked. But, at this node, why do one without the other?

To: Sarmad Y. Hermiz who wrote (243153)	11/1/2007 12:44:55 AM
From: Saturn V	Read Replies (1) \| Respond to of 275872

Does hi-k bring with it metal gates ? or are they independent ? I believe that today the Hafnium Oxide HiK dielectric technology requires metal gates. Intel is using different metals for p gates and n gates. At this time Intel is keeping the metal composition a trade secret. Apparently everyone else is also working with Hafnium Oxide as the dielectric. This was first explored at the SEMATECH consortium. Intel was the first to seize it and develop the technology further. Paul Otilleni made the statement that at the 32nm Intel will have the next generation of HiK technology, but did not elaborate any further. I am waiting for the IEDM conference in December to find out other disclosures of Intels HiK technologies. Interestingly Metal Gate MOS technology was the standard MOS technology used in the 60's. Remember the acronym MOS stands for Metal Oxide Semiconductor and Aluminum was the gate material. Intel was one of the pioneers of Silicon Gate Technology around 1970, and Intel had a competitive technology advantage for several years in the early 70's. Now the wheel has turned full circle, and Intel is leading the world back into Metal Gates.