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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: BillyG who wrote (7730)11/1/1997 3:04:00 PM
From: D.J.Smyth  Read Replies (3) | Respond to of 25960
 
Billy G <<Sematech isn't going to be able to broker a consensus this year among device makers and their equipment suppliers on what advanced lithography system to pursue for building the next generation of ICs. To keep on track and begin producing chips with feature sizes of 0.15-micron by 2003, Sematech originally had expected to narrow the choice among five fiercely competing technologies at its Colorado summit meeting this next week.>>

this is referring to using EUV or X-Ray, not DUV. DUV is already here. This is actually good news for DUV as it gives DUV a larger spread to implement, and especially good for Cymer since they'll be moving from Krypton Flouride Kr, .25mu, to Argon Flouride ArF to achieve .18mu. ArF systems will be ready, according to Cymer by the end of this year. This information comes from Angus. So, even before Komatsu has managed to get the .25mu out the door, Cymer willhave the capability of producing ArF systems by early next year.



To: BillyG who wrote (7730)11/1/1997 6:55:00 PM
From: BillyG  Respond to of 25960
 
There was an article about Japanese DUV R&D in my last link. I should have copied it into my post. Here it is:

Japan goes its own way

Sematech's grand plan to expand internationally and share the soaring costs
of R&D with foreign chip makers may have been dealt a fatal blow. Japan
Inc. is turning a cold shoulder to the symposium's overtures to form a global
advanced lithography R&D body and plans once again to launch its own
joint development effort, Jack Robertson writes in Semiconductor Business
News.

The Japanese consortium called Selete will be expanded to take on more of
a Sematech style of chip gear development role, say Japanese chip execs.
Selete will grow from its present 300-mm wafer equipment project, adding
projects to develop a deep UV argon fluoride laser and direct-write
electron-beam lithography.


They have a lot of catching up to do if they think they can catch CYMI.