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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: BillyG who wrote (8159)11/4/1997 8:47:00 PM
From: Peter V  Read Replies (2) | Respond to of 25960
 
Hi BillyG! Your last post concerns me a bit about CYMI's long-term prospects. What is the next progression point for lithography beyond 0.25 micron? I thought it was 0.18 micron. If so, that will give CYMI's optical lasers at least one more process iteration, won't it? But assuming the author is correct, can 0.25 and 0.18 micron processes be done with x-ray lithography? If so, is x-ray lithography far enough along to be implemented in manufacturing? Thanks for your thoughts.



To: BillyG who wrote (8159)11/5/1997 1:10:00 AM
From: Maxwell  Read Replies (2) | Respond to of 25960
 
BillyG:

<<"Lithography at an Inflection Point" on p. 127. It discusses the future of optical vs. x-ray lithography. The authors mention that optical lithography will begin to be impractical at about .13 micron. Do you agree?>>

Yes I agree. If you have a wavelength source less than .13um there is no known lens that can focus this wavelength. However at .15um focusing is still achievable. To achieve less than .13um with .198um-.15um wavelength source you need to apply some tricks. The trick is to etch into the .15um resist (done with conventional optical lithography) during the normal plasma etch of poly, oxide, metal, etc. This trick has been done and excellent resolution has been achieved. When you go to x-ray life is miserable and the cost goes up exponential. I'm not sure if <0.1um is even feasible.

Maxwell