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Technology Stocks : JMAR Technologies(JMAR) -- Ignore unavailable to you. Want to Upgrade?


To: timwa who wrote (4678)12/31/1997 7:07:00 PM
From: Bilberry  Respond to of 9695
 
Tim, thanks for the posting of the information on TFT production using lasers and JMAR's involvement. I was not aware that JMAR was this far into high definition TV and LCD screens. As a lot of us know, buying a laptop with a TFT screen is a very expensive proposition. I would like to know if using JMAR's Bright Light technology will reduce substantially the cost of these screens. What about quality? This is yet another use of JMAR's proprietary technology.

I would like to know what their timetable on this is. Is this one of those projects that JMAR has been keeping to itself?

You and everyone on this board have a good and profitable new year. Lets hope that 1998 makes JMAR a household name (at least with brokers and CNBC).

--Bilberry



To: timwa who wrote (4678)1/1/1998 4:37:00 AM
From: Bilberry  Read Replies (1) | Respond to of 9695
 
Tim, I read more info from the web site you provided and the Hitachi of Japan involvement in the flat panel LCD TFT displays. I have to wonder if JMAR is doing work with Hitachi and whether there is a joint venture coming out of this. I will try to find out more info on this. It seems that JMAR has a lot of things going on that they are keeping under wraps until they are ready to make them public. That is both appealing and frustrating to investors. Appealing because we are sitting on a diamond mine waiting to be tapped.

Anyone on the board, please see if you can find more info on this LCD flat panel display technology and what is JMAR's involvement with Hitachi?

--Bilberry

Source:
spie.org



To: timwa who wrote (4678)1/1/1998 5:38:00 AM
From: Bilberry  Read Replies (1) | Respond to of 9695
 
Tim, I found more info on the Hitachi connection. Took me several hours of searching on the web. This is really an exciting area. Here is what I found:

Paper #: 2992-16
spie.org
Excimer ablation lithography (EAL) for TFT-LCD, pp.98-107
Author(s): Kenkichi Suzuki, Hitachi, Ltd., Chiba, Japan; Masaaki Matsuda, Hitachi, Ltd., Chiba, Japan; Toshio Ogino, Hitachi, Ltd., Chiba, Japan; Nobuaki Hayashi, Hitachi, Ltd., Tokyo, Japan; Takao Terabayashi, Hitachi, Ltd., Yokohama, Japan; Kyouko Amemiya, Hitachi, Ltd., Yokohama, Japan.

Abstract: The excimer ablation lithography (EAL) is a process of
direct patterning and removal of a resist polymer film
by photo-decomposition ablation. Comparing to the
conventional photolithography, EAL does not need the
development process and realizes a non-vacuum dry
removal of resist. The main equipment for the new
processes is a kind of aligner- exposure for the resist
patterning and the removal, which reduce the cost of
the clean room and the equipments considerably. This is
very attractive for TFT-LCD manufacturing, as it is
required to reduce the cost severely. The large area
patterning and high throughput are essential for
TFT-LCD applications. To prove the feasibility, we
fabricated an experimental equipment for ablation
patterning. It is equipped with the high precision 300
$MUL 300 mm X-Y stages and a N.A. 0.1 image lens which
enable to explore the problems inherent to TFT panel of
a real size. In addition, two substantial technologies
were developed. One is a dielectric multilayer mask on
8 inch quartz substrate with precision enough for TFT
patterns. The other is high ablation rate resist
polymer. With these technologies, A4 size TFT laser was
fabricated by step and scan method. The results show
that EAL is in a good prospect for a new TFT
manufacturing technology. !4

Here are a couple of papers published by the head of JMAR Technology, Harry Shields, the same person doing the paper on flat panel LCD with Hitachi:

High-average-power picosecond-pulse excimer laser system for x-ray
generation


Powers, Michael F.; Shields, Harry A(JMAR Technology Co.)
Journal: Proc. SPIE Vol. 2992, p. 45-50, Excimer Lasers, Optics, and Applications, Harry Shields; Peter E. Dyer; Eds.
Publication Date: 03/1997
Origin: SPIE
perl.spie.org

High-power excimer laser-generated plasma source for x-ray microlithography

Authors:Shields, Harry; Powers, Michael F.; Turcu, I. C. Edmund; Ross, Ian N.; Maldonado, Juan R.; Burkhalter, Philip G.; Newman, D. A.

Publication Date: 09/1995
perl.spie.org

Excimer laser technology for soft x-ray generation

Authors: Powers, Michael F.; Shields, Harry
Publication Date: 06/1994
perl.spie.org

X-ray preionization technology for high pressure gas-discharge lasers

Authors: Shields, Harry
Publication Date: 04/1989
perl.spie.org