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Technology Stocks : General Lithography -- Ignore unavailable to you. Want to Upgrade?

To: Volsi Mimir who wrote (791)	2/27/1998 5:44:00 PM
From: Andrew Vance	Read Replies (4) \| Respond to of 1305

I am very familiar with this article. This was FAX'd to April by me yesterday or the day before (the days are melding into each other this week)<GG>. The techniques are there but the design librairies need to be established. We are close but not as close as you are being led to believe. It will take time to develop a 0.08u device technology library that can be debugged and put into production. The DPMI masks were not easy to make and if this becomes mainstream, you will need additional capacity to handle the long detailed processes encountered making PSM reticles. Also, the mask shop yields are a continuous process that is being addressed. I see the PSM as a limited and time consuming offering at this stage of the game. Volumes for those that use it will be expensive at first and require selectivity since a run for these types of reticles might cripple cycle time and productivity at the mask shops. The photosensitive materials are still in R&D volumes. Believe me when I say it is night and day between making a few gallons of this stuff in a laboratory setting and making 10s of thousands of gallons in mass production. this ramp up will take time. The rush for the steppers and the DUV soruces could be a stampede. I say that with a huge grin on my face since it will make us all happy. This should end this post on a good note since the demonstration of 0.08u features sizes with DUV should kick everyone into gear to order one or two DUV systems to put in a pilot line scenario, R&D setting, Advanced Process Development, or in limited production to shake the bugs out for each individual company. Everyone needs at least one or two "lead sled" dogs to allow them to remain competitive for when the time comes and to expedite your way on the learning curve for this technology. You do not want to enter this realm cold; you want to be sufficiently prepared. For us this is a good thing. When the stree realizes this, we get a nice pop. The question, as always, is the timing and not if it is going to happen. Sorta like the new 333 MHz PCs if you are a software developer. Your company doesn't throw away all the 200 or 266 systems and replace them with replace them all with the hot system. But you do make sure one is in your development lab to make sure your software runs on it and to develop a new suite of programs to capitalize of the added functionality. gradually you phase out the old stuff. But if you wait until the last moment, you are behind the learning curve and the 8-ball.<GGG> Andrew

To: Volsi Mimir who wrote (791)	5/22/1998 10:15:00 AM
From: curtis fincher	Read Replies (1) \| Respond to of 1305

With regards to Willson's 193nm resist keep in mind that there are no full field steppers available at the moment. In fact there is only one in existence at MIT/Lincoln labs. Everyone is relegated at the moment to use of the ISI micro stepper. In addition considerable work remains to bring that 193nm resist to production. Most likely will be that many 193 resist will find their way into use as 248 substitutes and eventually be used for both. A lot of work remains before anyone implements 193 in production.