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To: Andrew Vance who wrote (872)3/9/1998 5:06:00 PM
From: Crossy  Read Replies (1) | Respond to of 1305
 
Andrew,
regarding ISON, is this technique (istopical pure) beneficial at all, if You use the pure material

1) on the whole wafer (should be quite expensive)
2) as an epitaxial layer on an ordinary wafer (less expensive)

Does the "thermoelectric benefit" of the pure isotope Si-28 still pertain, if just an epitaxial layer on an otherwise standard wafer is of isotopic purity ?

Or does the whole equation change if You are moving over to a process with copper-interconnect technology, like the breakthru IBM demonstrated..

I heard differing opinion on this. What's Your take ??

best wishes
CROSSY



To: Andrew Vance who wrote (872)3/10/1998 12:01:00 AM
From: Peter Moyer  Read Replies (1) | Respond to of 1305
 
Sorry to change the topic, but is Integrated Solutions public?

<snip>
The new photoresist was developed to work specifically with Integrated
Solutions Inc.'s DUV ArF MicroStep 193-nm wafer stepper, which uses
Cymer's next-generation ArF laser. Industry consortium Sematech in
Austin, Tex., funded the project.
<snip>

Thanks,
Pete


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