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To: Larry Brew who wrote (390)	3/18/1998 1:52:00 PM
From: Katherine Derbyshire	Read Replies (2) \| Respond to of 955

Sorry, I don't believe that TI (or anyone else) is using 193 nm in production at .25 micron (or any other feature size). Production-volume tools for 193 nm do not exist, nor does the supporting infrastructure such as resists. I'm sure plenty of people are doing 193 nm R&D in the .25 micron range, but no one is using it in production. (If you don't believe me, feel free to ask the lithography vendor of your choice about pricing, availability, and specs for 193 nm tools.) The confusion arises because 248 nm and 193 nm are both "DUV wavelengths", and both use excimer lasers, as opposed to the i-line (365 nm) mercury lamp exposures generally used above 0.35 or so. Katherine