SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: George Coyne who wrote (18413)7/10/1998 1:47:00 PM
From: Ian@SI  Read Replies (1) | Respond to of 25960
 
G.W.,

Yes, but doesn't this capability tend to delay the necessity of purchasing of new lasers?

I don't think I understand your question. It's very difficult to draw a fine line with a crayon. DUV light source, e.g. a CYMI laser, facilitates drawing fine lines on wafers.

If you can't make masks that support .18æm features, that would reduce the need for new lasers.

Sorry, I suspect that we're talking past each other. Hopefully, someone who better understands your question will jump in...

Ian.



To: George Coyne who wrote (18413)7/10/1998 1:57:00 PM
From: FJB  Read Replies (2) | Respond to of 25960
 
G.W.,

RE:New lasers and masks.

Currently, PSMs are not being used widely in production.
Message 4640116 Based on what I've been reading, high NA stepper/scanners will be used to resolve 0.18 features which means using a 5010 model laser or better. The last 0.03æm might be accomplished through the use of PSMs, but currently their are almost no steppers/scanners out there with NAs of 0.68 or greater. So there will be an upgrade cycle in which high NA tools will need to be bought and those will be sold with the 5010 or Orion. Also, based on what I recall of a James Word post, PSMs aren't a good option for logic parts.

Bob