To: FJB who wrote (19016 ) 8/17/1998 12:03:00 PM From: BillyG Read Replies (2) | Respond to of 25960
New EUV light source? If true, this may not be good for CYMI. Realistically, we need to know about power output, stability, etc. It is a long road to qualification.... pubs.cmpnet.com A service of Semiconductor Business News, CMP Media Inc. Story posted at 7:30 a.m. EDT/4:30 a.m. PDT, 8/17/98 New EUV light source may cut cost of future litho systems, says physicist ORLANDO, Fla. -- A physicist with the University of Central Florida here said he has invented a powerful new light source for extreme ultraviolet (EUV) photolithography systems, which are expected to be used in the next decade to produce integrated circuits. "The actual discharge device is as small as my thumb and, together with the necessary electronics, can be packaged into the size of a small filing cabinet," said William Silfvast, inventor of the EUV light source. "It can be activated almost as simply as flipping on a light switch," added the UCF professor. The system, when fully developed, will require less electrical power than laser-based imaging systems need, according to Silfvast, whose work is being funded by the Semiconductor Research Corp. (SRC) consortium. Several EUV systems are now being explored by an industry consortium, called the Extreme Ultraviolet Limited Liability Corp. (EUVLLC), which is led by Intel Corp., Motorola Inc. and Advanced Micro Devices Inc. (see Sept. 11, 1997, story). A development team, headed by Silfvast, is now working with Sandia National Laboratories to evaluate performance requirements for EUV lithography tools and to develop an engineering prototype using the new light source. The EUV light is produced within a capillary tube with an opening about the size of the point on a ballpoint pen. The tube consists of electrically insulated materials with metal electrodes attached at each end. An intense electrical current is generated for short period of time in a low-pressure gas or vapor when voltage is applied across the electrodes. The EUV light is emitted from the ends of the tube, where it can be collected and use to expose device patterns on wafers.