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To: James Word who wrote (1871)	10/3/1998 2:53:00 AM
From: FJB	Read Replies (2) \| Respond to of 2946

James, I have a question for you, well, maybe several. Quite a few DRAM and logic manufacturers are claiming to be at 0.22µm and 0.21µm in terms of critical dimensions(drawn gate length I hope). The same companies claim to be moving to 0.18µm CDs in '99. So my question is, will they be able to achieve these types of resolutions with the original DUV steppers they have in place, or will they need to purchase new lithography tools? It's my current understanding that they will require new scanners(superior CD control with scanners?). I guess they could use PSMs to achieve such resolutions with the current litho tool set, but from what I have read regarding pricing of PSM mask sets this would be the less cost effective solution. I'm not asking if they will need SVGL scanners, but if they require new tools from any vendor period. And OPC is a given at 0.18, right? Still using binary masks of course? Please correct any problems in my understanding of 0.18 lithography requirements. Thanks in advance for any help or info, Bob