To: Elmer who wrote (59453 ) 5/24/1999 2:02:00 PM From: Yousef Read Replies (1) | Respond to of 1573921
Elmer & Other AMD Investors ... Here's an interesting article on Motorolo's efforts to integrate Copper damascene and Low K dielectrics -->eetimes.com "Electrical parametric measurements indicated that the structures not only survived the fabrication process intact, but also showed none of the technical problems that have previously plagued porous films, Weitzman said. Line resistance and inter-layer leakage resistance measurements indicated that the metal lines had been properly planarized and that the film remained mechanically sound. While highly successful, the work is the first step in a long qualification process. Weitzman estimated that if future development goes well, the new material could appear in Motorola production processes as early as 2002." Sounds a long way off to me ... I think that Yousef warned about Low K/Cu integration issues."IBM, for instance, is planning to introduce a sequence of low-k materials, each one appropriate to the process generation in which we will roll it out," Davari explained. "First we made the move to copper metal with a conventional oxide. Next, we plan to move to a fluoridated silicon glass formulation. That will reduce our k by 5 to 10 percent. Then we will move on to new materials. There is one in particular that is looking very good to us right now, that would give us an intrinsic k of about 2.7. From there, we plan to introduce porosity into the material, which will reduce k even further. And from there, we will move into the more exotic materials such as polymers." Sounds like IBM is taking a "surer" approach to Cu/Low K ... I wonder why Motorolo is taking the "risky" path. Could it be that Motorolo is behind ?? Make It So, Yousef