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Technology Stocks : Intel Corporation (INTC) -- Ignore unavailable to you. Want to Upgrade?

To: semiconeng who wrote (135959)	5/23/2001 1:39:50 PM
From: dale_laroy	Read Replies (1) \| Respond to of 186894

>>---That's one interpretation. Another would be: >>* Intel expecs a 193nm Stepper for the F22 0.13u ramp. Due to limited availability, this Stepper would most likely be used for Critical Layers only. Let's call this Stepper #1. >>* For other non-critical layers, intel installs several 248nm Steppers. For argument sake, let's say 2 Steppers, a primary and backup. and call them Stepper #2 and Stepper #3. >>* Intel begins the installation of the required infrastructure to support all 3 Steppers, ie: Pedestals, Electrical, Cooling fluid lines, etc etc etc.. >>THEN, SVGL announces a 3 month delay in delivery of Stepper #1. >>* Infrastructure installation continues on all 3 Steppers, but now, Stepper #2 is redesignated as a 248nm Phase Shifted Critical Layer Stepper, with Stepper #3 supporting the other layers. At the same time, the scheduled installation of Stepper #4 is accelerated. >>* Intel's Mask Manufacturing Operation (IMO) cuts a "deal" with another company to acquire their Phase Shift Mask Technology, and begins manufacturing of the required Phase Shift Masks for the 248nm Steppers. (This "deal" has already been announced) >>* When the 193nm stepper is ready, the "plumbing" is already in place, and Stepper #1 can take over critial layer duty responsability, freeing the 248nm Steppers #2 and #3 for extra non-critical layer processing capacity. >>With no cancellation of orders. It could also happen that way..... couldn't it? It could, and with the exception of the last point I suspect it might be close to the truth. My guess is that Intel will continue to use the PSM steppers where installed even after the 193nm Litho equipment begins to ship. They will simply continue the ramp with the original configuration using the 193nm Litho equipment for critical layers to produce their highest speed grades, while continuing to produce lower speed grades using PSM for the critical layers. Of course, towards the end of each fab's ramp they could switch to installing only 193nm Litho equipment in order to eliminate the less optimal PSM steppers.