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To: THE WATSONYOUTH who wrote (71076)	2/8/2002 7:38:51 AM
From: TGPTNDR	Read Replies (2) \| Respond to of 275872

TWY, Re: <Are these people so intimidated by Intel that a negative thought simply never enters their mind? How long do you think they would be posting here if suddenly they included negative prospects for some future Intel products?> Interesting questions for the thread that I don't remember and am not inclined to look it up right now if somebody else can provide a quick, factual response. Was Tenchusatsu here with Process Boy or is he Process Boy's replacement? Wasn't Process Boy promoted -- according to the PR at the time? How is Process Boy doing in his Career? tgptndr

To: THE WATSONYOUTH who wrote (71076)	2/8/2002 12:10:29 PM
From: hmaly	Respond to of 275872

TWY RE..In my opinion, it is not possible for someone working for a large company and in a position to have inside information to not have at least a FEW genuine negative thoughts/opinions/comments about SOME of the things that are going on. <<<<<<<< I believe I have seen some slightly negative comments from Tench. However, Tench posted awhile back that a lot of people attack Intel and him automatically, because they dislike Intel. You would also be on guard, if every time you said something, others would automatically attack you. He probably believes in himself and in his work. I sell concrete. If people say that concrete itself has flaws, I will agree. Concrete isn't a perfect building material, it has flaws. But if someone were to say that concrete has more flaws than ony other replacement building material, and we should use wood, or plastic for instance instead; I would defend concrete, because concrete is the best material in some instances, for the price. Also, a lot of people translate concrete's flaws into faulty work, (lawyers especially) and blame the person ,rather than the product; which I take offense at also sometimes. I don't control the weather, the delivery trucks, the batching, or the hardness of gavel used. I just order it, spread it out, and make it look good; and I don't like being blamed for events I can't control. I would guess Tench doesn't either. And, please don't equate them with posters like NiceGuy or Dan3. These are INTEL EMPLOYEES. <<<<< Why not. Intel employees are hardly subhuman. I would expect they also have feelings like pride, trust, and honesty also. I honestly believe in the product I am selling; otherwise I wouldn't be selling it. Do I have perfect employees, who always show up perfectly on time in perfect condition, and always do perfect work. NO Do I tell my customers that they can expect less than perfect work from time to time, because of that. What do you think? Tench doesn't want to say anything bad about Intel for the same reason I don't badmouth my work. It can cost you. And, I can assure the thread that my feelings are "real" and "genuine".<<<<<<<<<<< They may be real or genuine, but that doesn't necessarily make them wise. We all know where Tench works. I don't have any idea where you work, I don't care, and it is not that important to me. But I would have real concerns about your employers products, if all the employees badmouthed their employer, and or their products. Tench badmouthing Intel would just give the people who hate Intel more ammunition. It may make him sound more human,but a lot of people would just thrash him and his company more; for minor problems we all have. Why would he do that?

To: THE WATSONYOUTH who wrote (71076)	2/8/2002 2:33:07 PM
From: Tenchusatsu	Respond to of 275872

TWY, <it is not possible for someone working for a large company and in a position to have inside information to not have at least a FEW genuine negative thoughts/opinions/comments about SOME of the things that are going on.> Perhaps you missed my comments about HyperTransport and 3GIO (though this was on the unmodded thread): Message 16981005 Or perhaps you missed my comments regarding AMD's potential gains in mobile and 2P servers/workstations this year. Or perhaps you missed my reversal on RDRAM after MPF 2000. Or my criticism of the Pentium III serial number as inadequate for digital authentication. But hey, I'm sure nothing will erase your prejudice of me, because you'd rather listen to the tons of B.S. being spewed by AMDroids than even the hints of truth from people in the know. Tenchusatsu

To: THE WATSONYOUTH who wrote (71076)	2/11/2002 10:57:52 PM
From: milo_morai	Read Replies (1) \| Respond to of 275872

<font color=green>UMC dropping Dow's SiLK from performance 130-nm process By Mike Clendenin EE Times (02/11/02 16:08 p.m. EST) TAIPEI, Taiwan — After working with Dow Chemical's low-k dielectric film for nearly a year, United Microelectronics Corp. is preparing to drop Dow's SiLK from its high-performance 130-nanometer process, choosing a path different than that of development partner IBM Corp. The Taiwanese foundry is winding down the last few products using SiLK and offering instead a Coral-based dielectric film from Novellus Systems, which UMC calls "K-film." It has a similar dielectric constant to SiLK's — 2.7 — but UMC said it has found K-film easier to implement and more scalable. Also, K-film uses existing chemical vapor-deposition machinery already in place in UMC fabs, the company said. Even though UMC touted SiLK in the early days of its 130-nm implementation, the company pursued Coral as an alternative, said Fu-tai Liou, the sales and marketing chief and former chief technology officer at UMC. But difficulties, including cracking of the film because of untenable thermal expansion, plagued the smooth ramp-up of the material in a volume environment, he said. UMC made the decision to quietly switch over toward the end of last year. The foundry is not alone in its troubles with low-k films, which are needed to reduce interconnect delay in 130-nm copper-based processes. Rival Taiwan Semiconductor Manufacturing Co. has also reported difficulties but seems to have worked through them more quickly. TSMC uses Black Diamond, a low-k film from Applied Materials. UMC licensed its 130-nm logic process from the IBM-Infineon technology development partnership. Both IBM and Infineon use the SiLK low-k dielectric, a spin-n material with a k-value of 2.65. Liou said the changeover at UMC shouldn't have any negative impact on customers because of the similarity in dielectric constant of SiLK and K-film. For the foundry, however, the switch is seen as helping smooth the transition to reliable yields at the 130-nm process node and beyond. "We found that the scalability of the K-film is much better to use down to 0.1 micron, so instead of using it for one generation we can at least use it for two generations," Liou said. UMC is also exploring using the film at the 70-nm node. siliconstrategies.com