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Technology Stocks : Advanced Micro Devices - Moderated (AMD) -- Ignore unavailable to you. Want to Upgrade?

To: combjelly who wrote (196869)	5/15/2006 4:48:13 PM
From: dougSF30	Read Replies (1) \| Respond to of 275872

Quadruples the risk. Really. And then to do it on a tight development schedule means they are rushing. I don't know about rushing, but I think someone is "reaching" here. :)

To: combjelly who wrote (196869)	5/15/2006 5:03:19 PM
From: Hans de Vries	Read Replies (3) \| Respond to of 275872

Re:They have slated high-k and metal gates. These are major changes to the way chips are made This was heralded as the major breakthrough for 45 nm node not so long ago by Intel. They have since retracted and it won't be used anymore at the 45nm node. Interestingly AMD was first in applying metal gates to solve the Fermi-level-pinning of the high-k gate stack and they even tried to convince IBM in using it. for the 65nm node AMD was leading the way here. It now looks that high-k/metal gates will be used at the next node (32 nm) with as main candidates HfO2 or HfSiO4 as the dielectricum and Tantalium, Molybdeen or Ruthium for the metal gates. Probly combined with a treatment of N or C to tune the gate workfunction at the interface, with C looking particular good. Regards, Hans