To: Maxwell who wrote (4778 ) 3/6/1998 12:51:00 AM From: James Yu Respond to of 6843
Maxwell, One more point - IBM's copper process is behind AMD. Here is an article of IBM's copper process. TechSearch - IBM scores CMOS breakthrough September 22, 1997, by Crista Souza Silicon Valley- IBM Corp. has developed a breakthrough CMOS manufacturing process that analysts say could put the company at the cutting edge of the chip industry. Using copper interconnects instead of the traditional aluminum between metal layers, the company resolved one of the metallization problems that has held back development of powerful chips with true line geometries tighter than 0.25 micron. IBM Microelectronics, Fishkill, N.Y., is preparing the process for commercial rollout with PowerPC microprocessors and ASICs starting at 0.2 micron (L-drawn), although the company said 0.16 micron (L-drawn) has been achieved. Known as CMOS 7S, the 1.8-V technology uses insulated copper interconnects to boost performance over transistor channel lengths as small as 0.10 micron (L-effective). CMOS 7S stacks six metal layers to pack between 150 million and 200 million transistors on a chip. In the ASIC world, that translates to as many as 12 million logic gates. "This is two to three years ahead of the competition," said Handel Jones, an analyst at International Business Strategies, Los Gatos, Calif. "From a system-IC point of view, it is one of the most important things to emerge to date," Jones said. The CMOS 7S development will no doubt catch the attention of both high-end workstation and portable-computer OEMs, which stand to benefit from the increasing speed and complexity of chips that are smaller and require little power to run. And it could go a long way toward solidifying IBM's position as a leader in the merchant chip market. Long recognized as a technology innovator, IBM in just the last few years has made its chips commercially available. "The big difference now is, IBM understands how to develop a technology advantage and then how to bring it to market," Jones said. "I think they could become a major powerhouse."IBM will introduce CMOS 7S today, nearly a year before the chips based on the process will be ready for commercial release. The process is in qualification at the company's Fishkill and Burlington, Vt., factories. Production is slated to begin by mid-1998, although IBM declined to discuss volumes. Using copper interconnects reduces the resistivity that aluminum introduces as signal speed increases. Industry sources said that developments beyond the 0.25-micron generation have been inhibited by the subsequent deterioration in metal conductivity. "I think this is one of the key breakthroughs that will allow scaling to a much higher density," said Bijan Davari, IBM fellow and senior manager of logic technology development. Copper metallization has been studied by the industry for some time. It took IBM's research and microelectronics divisions nearly 15 years of collaborative effort to introduce copper into the CMOS process, resulting in a number of patents along the way, Davari said. However, most of the underlying technology, such as the use of damascene with copper, is in the public domain. Between 1994 and 1996, IBM demonstrated the use of copper interconnects for Sematech, a semiconductor manufacturing research consortium. A number of other companies are said to be developing copper processes. IBM, however, may be the first to bring one to market. Copper has a tendency to "poison" silicon, which makes a chip nonfunctional, Davari said. So instead of metal etching, the company used a dual damascene technique to insulate the copper from the silicon. Alternative approaches to copper are also in development, such as the use of dielectrics as insulation between metal lines. Chip makers have also been looking at fluorinated silicon oxide and other more exotic materials. "I think many of our competitors will go after [dielectrics]," said John Heidenreich, manager of advanced interconnect at IBM Microelectronics. "Ultimately the whole industry will go to a combination of copper and dielectrics. It just happens that we've chosen to go with copper first." IBM claims chips produced with CMOS 7S can support up to 3,000 I/O connections on a single piece of silicon. Its recently introduced C4 package makes that level of I/O density possible, the company said. Copyright (c) 1997 CMP Media Inc. Best wishes James